Authors
Thomas Thurn‐Albrecht, Rachel Steiner, Jason DeRouchey, Christopher M Stafford, Elbert Huang, Mustafa Bal, Mark Tuominen, Craig J Hawker, Thomas P Russell
Publication date
2000/6
Journal
Advanced Materials
Volume
12
Issue
11
Pages
787-791
Publisher
WILEY‐VCH Verlag GmbH
Description
Ordered nanoporous films have been generated via selective degradation of self‐assembled block copolymer films of polystyrene (PS) and poly(methylmethacrylate) (PMMA), which contain oriented cylindrical microdomains. Deep UV irradiation degrades the PMMA, which can be rinsed away, leaving an ordered array of circular holes in a film of cross‐linked PS (see Figure).
Total citations
Scholar articles
T Thurn‐Albrecht, R Steiner, J DeRouchey, CM Stafford… - Advanced Materials, 2000
